Spontaneous growth of indium nanostructures

Helin L. Wei; Lei Zhang; Zuli Liu; Hanchen Huang; Xixiang Zhang

doi:10.1016/j.jcrysgro.2006.09.048

Spontaneous growth of indium nanostructures

Helin L. Wei^*, Lei Zhang, Zuli Liu, Hanchen Huang, Xixiang Zhang

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

We report the spontaneous formation of well-aligned indium (In) hillock on silicon substrate with a thin Au film as buffer layer by using DC magnetron sputtering method. The morphologies and the microstructures have been investigated by scanning electron microscopy (SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). The mechanism of the hillock formation can be described as follows: (1) low-dimensional (LD) alloy surface formation; (2) In adatom diffusing on LD-alloy surface to form cluster; (3) clusters coalescence to form two-dimensional island (2D-island); and (4) 2D-islands grow up and form hillock.

Original language	English (US)
Pages (from-to)	300-305
Number of pages	6
Journal	Journal of Crystal Growth
Volume	297
Issue number	2
DOIs	https://doi.org/10.1016/j.jcrysgro.2006.09.048
State	Published - Dec 29 2006
Externally published	Yes

Keywords

A1. Growth models
A1. Low-dimensional alloy surface
A1. Nanostructures
A1. Non-wetting
A3. DC magnetron sputtering
B1. Indium hillock

ASJC Scopus subject areas

Condensed Matter Physics
Inorganic Chemistry
Materials Chemistry

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10.1016/j.jcrysgro.2006.09.048

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@article{24706f8965d94233a7f3433befa1b22a,

title = "Spontaneous growth of indium nanostructures",

abstract = "We report the spontaneous formation of well-aligned indium (In) hillock on silicon substrate with a thin Au film as buffer layer by using DC magnetron sputtering method. The morphologies and the microstructures have been investigated by scanning electron microscopy (SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). The mechanism of the hillock formation can be described as follows: (1) low-dimensional (LD) alloy surface formation; (2) In adatom diffusing on LD-alloy surface to form cluster; (3) clusters coalescence to form two-dimensional island (2D-island); and (4) 2D-islands grow up and form hillock.",

keywords = "A1. Growth models, A1. Low-dimensional alloy surface, A1. Nanostructures, A1. Non-wetting, A3. DC magnetron sputtering, B1. Indium hillock",

author = "Wei, {Helin L.} and Lei Zhang and Zuli Liu and Hanchen Huang and Xixiang Zhang",

year = "2006",

month = dec,

day = "29",

doi = "10.1016/j.jcrysgro.2006.09.048",

language = "English (US)",

volume = "297",

pages = "300--305",

journal = "Journal of Crystal Growth",

issn = "0022-0248",

publisher = "Elsevier B.V.",

number = "2",

}

TY - JOUR

T1 - Spontaneous growth of indium nanostructures

AU - Wei, Helin L.

AU - Zhang, Lei

AU - Liu, Zuli

AU - Huang, Hanchen

AU - Zhang, Xixiang

PY - 2006/12/29

Y1 - 2006/12/29

N2 - We report the spontaneous formation of well-aligned indium (In) hillock on silicon substrate with a thin Au film as buffer layer by using DC magnetron sputtering method. The morphologies and the microstructures have been investigated by scanning electron microscopy (SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). The mechanism of the hillock formation can be described as follows: (1) low-dimensional (LD) alloy surface formation; (2) In adatom diffusing on LD-alloy surface to form cluster; (3) clusters coalescence to form two-dimensional island (2D-island); and (4) 2D-islands grow up and form hillock.

AB - We report the spontaneous formation of well-aligned indium (In) hillock on silicon substrate with a thin Au film as buffer layer by using DC magnetron sputtering method. The morphologies and the microstructures have been investigated by scanning electron microscopy (SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). The mechanism of the hillock formation can be described as follows: (1) low-dimensional (LD) alloy surface formation; (2) In adatom diffusing on LD-alloy surface to form cluster; (3) clusters coalescence to form two-dimensional island (2D-island); and (4) 2D-islands grow up and form hillock.

KW - A1. Growth models

KW - A1. Low-dimensional alloy surface

KW - A1. Nanostructures

KW - A1. Non-wetting

KW - A3. DC magnetron sputtering

KW - B1. Indium hillock

UR - http://www.scopus.com/inward/record.url?scp=33845594199&partnerID=8YFLogxK

U2 - 10.1016/j.jcrysgro.2006.09.048

DO - 10.1016/j.jcrysgro.2006.09.048

M3 - Article

AN - SCOPUS:33845594199

SN - 0022-0248

VL - 297

SP - 300

EP - 305

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

IS - 2

ER -

Spontaneous growth of indium nanostructures

Abstract

Keywords

ASJC Scopus subject areas

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