Stability and effect of annealing on the optical properties of plasma-deposited Ta₂O₅ and Nb₂O₅ films

Engineering

• Room Temperature 100%
• Si Substrate 50%
• Oxide Layer 50%
• Temperature Range 50%
• Fourier Transform 50%
• Deposited Film 50%
• Annealing Temperature 50%
• Broadening 50%
• Thin Films 50%
• Vapor Deposition 50%
• Refractive Index 50%
• Chemical Vapor Deposition 50%
• Interdiffusion 50%
• Extinction Coefficient 50%

Material Science

• Annealing 100%
• Secondary Ion Mass Spectrometry 50%
• Metal Oxide 25%
• Plasma-Enhanced Chemical Vapor Deposition 25%
• Tantalum 25%
• Fourier Transform Infrared Spectroscopy 25%
• Niobium 25%
• Refractive Index 25%
• Amorphous Material 25%
• Oxide Compound 25%
• Thin Films 25%
• Tantalum Oxides 25%
• Niobium Oxide 25%

Keyphrases

• Ta2O5 Film 100%
• Nb2O5 Films 100%
• Silicon Diffusion 16%
• Optical Thin Film 16%