TY - JOUR
T1 - Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films
AU - Sun, Ke
AU - Saadi, Fadl H.
AU - Lichterman, Michael F.
AU - Hale, William G.
AU - Wang, Hsinping
AU - Zhou, Xinghao
AU - Plymale, Noah T.
AU - Omelchenko, Stefan T.
AU - He, Jr-Hau
AU - Papadantonakis, Kimberly M.
AU - Brunschwig, Bruce S.
AU - Lewis, Nathan S.
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: This material is based on work performed by the Joint Center for Artificial Photosynthesis, a Department of Energy (DOE) Energy Innovation Hub, supported through the Office of Science of the US DOE under Award DE-SC0004993. N.T.P. acknowledges support from the Graduate Research Fellowship Program of the US National Science Foundation. B.S.B. was supported by the Beckman Institute of the California Institute of Technology. This work was also supported by the Gordon and Betty Moore Foundation under Award GBMF1225.
PY - 2015/3/11
Y1 - 2015/3/11
N2 - Reactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g). © 2015, National Academy of Sciences. All rights reserved.
AB - Reactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g). © 2015, National Academy of Sciences. All rights reserved.
UR - http://hdl.handle.net/10754/564102
UR - http://www.ncbi.nlm.nih.gov/pmc/articles/PMC4378389
UR - http://www.scopus.com/inward/record.url?scp=84925428446&partnerID=8YFLogxK
U2 - 10.1073/pnas.1423034112
DO - 10.1073/pnas.1423034112
M3 - Article
C2 - 25762067
SN - 0027-8424
VL - 112
SP - 3612
EP - 3617
JO - Proceedings of the National Academy of Sciences
JF - Proceedings of the National Academy of Sciences
IS - 12
ER -