TY - JOUR
T1 - Structural and electronic properties of silicene on MgX2 (X = Cl, Br, and I)
AU - Zhu, Jiajie
AU - Schwingenschlögl, Udo
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: Research reported in this publication was supported by the King Abdullah University of Science and Technology (KAUST).
PY - 2014/7/8
Y1 - 2014/7/8
N2 - Silicene is a monolayer of Si atoms in a two-dimensional honeycomb lattice, being expected to be compatible with current Si-based nanoelectronics. The behavior of silicene is strongly influenced by the substrate. In this context, its structural and electronic properties on MgX2 (X = Cl, Br, and I) have been investigated using first-principles calculations. Different locations of the Si atoms are found to be energetically degenerate because of the weak van der Waals interaction with the substrates. The Si buckling height is below 0.55 Å, which is close to the value of free-standing silicene (0.49 Å). Importantly, the Dirac cone of silicene is well preserved on MgX2 (located slightly above the Fermi level), and the band gaps induced by the substrate are less than 0.1 eV. Application of an external electric field and stacking can be used to increase the band gap. © 2014 American Chemical Society.
AB - Silicene is a monolayer of Si atoms in a two-dimensional honeycomb lattice, being expected to be compatible with current Si-based nanoelectronics. The behavior of silicene is strongly influenced by the substrate. In this context, its structural and electronic properties on MgX2 (X = Cl, Br, and I) have been investigated using first-principles calculations. Different locations of the Si atoms are found to be energetically degenerate because of the weak van der Waals interaction with the substrates. The Si buckling height is below 0.55 Å, which is close to the value of free-standing silicene (0.49 Å). Importantly, the Dirac cone of silicene is well preserved on MgX2 (located slightly above the Fermi level), and the band gaps induced by the substrate are less than 0.1 eV. Application of an external electric field and stacking can be used to increase the band gap. © 2014 American Chemical Society.
UR - http://hdl.handle.net/10754/563658
UR - https://pubs.acs.org/doi/10.1021/am502469m
UR - http://www.scopus.com/inward/record.url?scp=84905015638&partnerID=8YFLogxK
U2 - 10.1021/am502469m
DO - 10.1021/am502469m
M3 - Article
C2 - 25000976
SN - 1944-8244
VL - 6
SP - 11675
EP - 11681
JO - ACS Applied Materials & Interfaces
JF - ACS Applied Materials & Interfaces
IS - 14
ER -