Material Science
Pulsed Laser Deposition
100%
Refractive Index
100%
Thin Films
100%
Permittivity
66%
Grain Size
66%
Film
66%
Oscillator
66%
Annealing
33%
Carrier Concentration
33%
Diffraction Pattern
33%
Lattice Constant
33%
Tungsten
33%
Laser Ablation
33%
Barium Titanate
33%
Atomic Force Microscopy
33%
Amorphous Material
33%
Engineering
Pulsed Laser
100%
Thin Films
100%
Refractive Index
100%
Silicon Substrate
66%
Dielectrics
66%
Carrier Density
33%
Glass Substrate
33%
Energy Gap
33%
Film Surface
33%
Average Grain Size
33%
Mass Ratio
33%
Barium Titanate
33%
Assuming
33%
Atomic Force Microscopy
33%
Cubic Symmetry
33%
Lattice Constant
33%
Keyphrases
Doped BaTiO3
100%
Oscillator Parameters
33%
Envelope Method
33%
Barium Titanate Thin Film
33%
Effective Mass Ratio
33%
Single Oscillator Model
33%