TY - JOUR
T1 - Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning
AU - Li, Li
AU - Chakrabarty, Souvik
AU - Spyrou, Konstantinos
AU - Ober, Christopher K.
AU - Giannelis, Emmanuel P.
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: The authors gratefully acknowledge the funding support from SEMATECH and facilities support from Lawrence Berkeley National Laboratory (LBNL), Cornell Nanoscale Science and Technology (CNF), the Cornell Center for Materials Research (CCMR), and the KAUST-Cornell Center of Energy and Sustainability (KAUST-CU).
This publication acknowledges KAUST support, but has no KAUST affiliated authors.
PY - 2015/7/13
Y1 - 2015/7/13
N2 - © 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their particle sizes show a dramatic increase from the initial 3-4 nm to submicron size after exposure, with no apparent inorganic content or thermal property change detected. XPS results showed that the mass percentage of the carboxylic group in the structure of nanoparticles decreased with increasing exposure duration. The particle coarsening sensitivities of those hybrid nanoparticles are consistent with their EUV performance. The current work provides an understanding for the development mechanism and future guidance for the design and processing of high performance resist materials for large-scale microelectronics device fabrication.
AB - © 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their particle sizes show a dramatic increase from the initial 3-4 nm to submicron size after exposure, with no apparent inorganic content or thermal property change detected. XPS results showed that the mass percentage of the carboxylic group in the structure of nanoparticles decreased with increasing exposure duration. The particle coarsening sensitivities of those hybrid nanoparticles are consistent with their EUV performance. The current work provides an understanding for the development mechanism and future guidance for the design and processing of high performance resist materials for large-scale microelectronics device fabrication.
UR - http://hdl.handle.net/10754/599792
UR - https://pubs.acs.org/doi/10.1021/acs.chemmater.5b01506
UR - http://www.scopus.com/inward/record.url?scp=84937959848&partnerID=8YFLogxK
U2 - 10.1021/acs.chemmater.5b01506
DO - 10.1021/acs.chemmater.5b01506
M3 - Article
SN - 0897-4756
VL - 27
SP - 5027
EP - 5031
JO - Chemistry of Materials
JF - Chemistry of Materials
IS - 14
ER -