Sub-micron structured metal oxide gas sensors by means of lithographic techniques

Patrizio Candeloro; Camilla Baratto; Elisabetta Comini; Guido Faglia; Enzo M. Di Fabrizio; Giorgio Sberveglieri

Sub-micron structured metal oxide gas sensors by means of lithographic techniques

Patrizio Candeloro^*, Camilla Baratto, Elisabetta Comini, Guido Faglia, Enzo M. Di Fabrizio, Giorgio Sberveglieri

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

Original language	English (US)
Title of host publication	Semiconductor Materials for Sensing
Editors	S Seal, MI Baraton, C Parrish, N Murayama
Publisher	Materials Research Society
Pages	103-108
Number of pages	6
Volume	828
ISBN (Print)	1-55899-776-8
State	Published - 2005
Externally published	Yes
Event	Symposium on Semiconductor Materials for Sensing held at the 2004 MRS Fall Meeting - Boston, United States Duration: Nov 29 2004 → Dec 2 2004

Publication series

Name	MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Publisher	MATERIALS RESEARCH SOCIETY
Volume	828
ISSN (Print)	0272-9172

Conference

Conference	Symposium on Semiconductor Materials for Sensing held at the 2004 MRS Fall Meeting
Country/Territory	United States
City	Boston
Period	11/29/04 → 12/2/04

Keywords

THIN-FILMS
SNO2

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

Cite this

Candeloro, P., Baratto, C., Comini, E., Faglia, G., Di Fabrizio, E. M., & Sberveglieri, G. (2005). Sub-micron structured metal oxide gas sensors by means of lithographic techniques. In S. Seal, MI. Baraton, C. Parrish, & N. Murayama (Eds.), Semiconductor Materials for Sensing (Vol. 828, pp. 103-108). (MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS; Vol. 828). Materials Research Society.

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title = "Sub-micron structured metal oxide gas sensors by means of lithographic techniques",

abstract = "In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.",

keywords = "THIN-FILMS, SNO2",

author = "Patrizio Candeloro and Camilla Baratto and Elisabetta Comini and Guido Faglia and {Di Fabrizio}, {Enzo M.} and Giorgio Sberveglieri",

year = "2005",

language = "English (US)",

isbn = "1-55899-776-8",

volume = "828",

series = "MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS",

publisher = "Materials Research Society",

pages = "103--108",

editor = "S Seal and MI Baraton and C Parrish and N Murayama",

booktitle = "Semiconductor Materials for Sensing",

address = "United States",

note = "Symposium on Semiconductor Materials for Sensing held at the 2004 MRS Fall Meeting ; Conference date: 29-11-2004 Through 02-12-2004",

}

Candeloro, P, Baratto, C, Comini, E, Faglia, G, Di Fabrizio, EM & Sberveglieri, G 2005, Sub-micron structured metal oxide gas sensors by means of lithographic techniques. in S Seal, MI Baraton, C Parrish & N Murayama (eds), Semiconductor Materials for Sensing. vol. 828, MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, vol. 828, Materials Research Society, pp. 103-108, Symposium on Semiconductor Materials for Sensing held at the 2004 MRS Fall Meeting, Boston, United States, 11/29/04.

Sub-micron structured metal oxide gas sensors by means of lithographic techniques. / Candeloro, Patrizio; Baratto, Camilla; Comini, Elisabetta et al.
Semiconductor Materials for Sensing. ed. / S Seal; MI Baraton; C Parrish; N Murayama. Vol. 828 Materials Research Society, 2005. p. 103-108 (MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS; Vol. 828).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Sub-micron structured metal oxide gas sensors by means of lithographic techniques

AU - Candeloro, Patrizio

AU - Baratto, Camilla

AU - Comini, Elisabetta

AU - Faglia, Guido

AU - Di Fabrizio, Enzo M.

AU - Sberveglieri, Giorgio

PY - 2005

Y1 - 2005

N2 - In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

AB - In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

KW - THIN-FILMS

KW - SNO2

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M3 - Conference contribution

AN - SCOPUS:20344387683

SN - 1-55899-776-8

VL - 828

T3 - MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS

SP - 103

EP - 108

BT - Semiconductor Materials for Sensing

A2 - Seal, S

A2 - Baraton, MI

A2 - Parrish, C

A2 - Murayama, N

PB - Materials Research Society

T2 - Symposium on Semiconductor Materials for Sensing held at the 2004 MRS Fall Meeting

Y2 - 29 November 2004 through 2 December 2004

ER -

Sub-micron structured metal oxide gas sensors by means of lithographic techniques

Abstract

Publication series

Conference

Keywords

ASJC Scopus subject areas

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