Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

Yu An Dai; Hung Chih Chang; Kun Yu Lai; Chin An Lin; Ren Jei Chung; Gong Ru Lin; Jr Hau He

doi:10.1039/c0jm00524j

Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

Yu An Dai, Hung Chih Chang, Kun Yu Lai, Chin An Lin, Ren Jei Chung, Gong Ru Lin, Jr Hau He^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

82 Scopus citations

Abstract

Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159°). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.

Original language	English (US)
Pages (from-to)	10924-10930
Number of pages	7
Journal	Journal of Materials Chemistry
Volume	20
Issue number	48
DOIs	https://doi.org/10.1039/c0jm00524j
State	Published - Dec 28 2010
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
Materials Chemistry

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@article{971acbff312e4826b821dcc41607cd7a,

title = "Subwavelength Si nanowire arrays for self-cleaning antireflection coatings",

abstract = "Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159°). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.",

author = "Dai, {Yu An} and Chang, {Hung Chih} and Lai, {Kun Yu} and Lin, {Chin An} and Chung, {Ren Jei} and Lin, {Gong Ru} and He, {Jr Hau}",

year = "2010",

month = dec,

day = "28",

doi = "10.1039/c0jm00524j",

language = "English (US)",

volume = "20",

pages = "10924--10930",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

publisher = "Royal Society of Chemistry",

number = "48",

}

TY - JOUR

T1 - Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

AU - Dai, Yu An

AU - Chang, Hung Chih

AU - Lai, Kun Yu

AU - Lin, Chin An

AU - Chung, Ren Jei

AU - Lin, Gong Ru

AU - He, Jr Hau

PY - 2010/12/28

Y1 - 2010/12/28

N2 - Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159°). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.

AB - Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159°). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.

UR - http://www.scopus.com/inward/record.url?scp=78649714033&partnerID=8YFLogxK

U2 - 10.1039/c0jm00524j

DO - 10.1039/c0jm00524j

M3 - Article

AN - SCOPUS:78649714033

SN - 0959-9428

VL - 20

SP - 10924

EP - 10930

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

IS - 48

ER -

Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

Abstract

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