Abstract
We have implemented a new high resolution imaging system independent of the image sensor's pixel size. This superresolution is achieved by integrating a nano-aperture patterned in the first metal layer within the pixel using a standard CMOS process. The image sensor's focal plane is scanned with a sub-micron step to obtain the super-resolution image. To experimentally verify the operation of our technique, we have fabricated a standard 3-Transistors (3T) active pixel sensors with integrated nano-apertures in a 0.13μm CMOS technology. Here,we describe the concept of our super-resolution imaging and elaborate on our fabricated design and experimental setup.
Original language | English (US) |
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Article number | 4672135 |
Pages (from-to) | 515-518 |
Number of pages | 4 |
Journal | Proceedings of the Custom Integrated Circuits Conference |
DOIs | |
State | Published - 2008 |
Externally published | Yes |
Event | IEEE 2008 Custom Integrated Circuits Conference, CICC 2008 - San Jose, CA, United States Duration: Sep 21 2008 → Sep 24 2008 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering