TY - JOUR
T1 - Synthesis of SiOC:H nanoparticles by electrical discharge in hexamethyldisilazane and water
AU - Hamdan, Ahmad
AU - AbdulHalim, Rasha
AU - Anjum, Dalaver H.
AU - Cha, Min Suk
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: The research reported in this publication was supported by King Abdullah University of Science and Technology (KAUST).
PY - 2017/7/25
Y1 - 2017/7/25
N2 - Nanoparticles have unique properties and are useful in many applications. Efficient synthesis of high yields of nanoparticles remains a challenge. Here, we synthesized SiOC:H, a low-dielectric-constant material, by electrical discharge at the interface of hexamethyldisilazane and water. The nanoparticle production rate of our technique was ∼17 mg per minute. We used Fourier transform infrared spectroscopy, scanning and transmission electron microscopy, and X-ray photoemission spectroscopy to characterize the synthesized material. Heating the nanoparticles to 500 °C for 2 h released hydrogen from CHx groups and evaporated volatile compounds. Our method to produce high yields of low-dielectric-constant nanoparticles for microelectronic applications is promising.
AB - Nanoparticles have unique properties and are useful in many applications. Efficient synthesis of high yields of nanoparticles remains a challenge. Here, we synthesized SiOC:H, a low-dielectric-constant material, by electrical discharge at the interface of hexamethyldisilazane and water. The nanoparticle production rate of our technique was ∼17 mg per minute. We used Fourier transform infrared spectroscopy, scanning and transmission electron microscopy, and X-ray photoemission spectroscopy to characterize the synthesized material. Heating the nanoparticles to 500 °C for 2 h released hydrogen from CHx groups and evaporated volatile compounds. Our method to produce high yields of low-dielectric-constant nanoparticles for microelectronic applications is promising.
UR - http://hdl.handle.net/10754/625703
UR - http://onlinelibrary.wiley.com/doi/10.1002/ppap.201700089/full
UR - http://www.scopus.com/inward/record.url?scp=85026299638&partnerID=8YFLogxK
U2 - 10.1002/ppap.201700089
DO - 10.1002/ppap.201700089
M3 - Article
AN - SCOPUS:85026299638
SN - 1612-8850
VL - 14
SP - 1700089
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
IS - 12
ER -