TY - GEN
T1 - Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists
AU - Jiang, Jing
AU - Yu, Mufei
AU - Zhang, Ben
AU - Neisser, Mark
AU - Chun, Jun Sung
AU - Giannelis, Emmanuel P.
AU - Ober, Christopher K.
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: The authors gratefully acknowledge international SEMATECH for funding. We thank the Lawrence Berkeley NationalLaboratory (LBNL), the Cornell Nanoscale Science and Technology Facility (CNF), the Cornell Center for MaterialsResearch (CCMR) and the KAUST-Cornell Center for Energy and Sustainability (KAUST-CU) for use of theirfacilities.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.
PY - 2015/3/19
Y1 - 2015/3/19
N2 - Ligand stabilized metal oxide nanoparticle resists are promising candidates for EUV lithography due to their high sensitivity for high-resolution patterning and high etching resistance. As ligand exchange is responsible for the patterning mechanism, we systematically studied the influence of ligand structures of metal oxide EUV nanoparticles on their sensitivity and dissolution behavior. ZrO2 nanoparticles were protected with various aromatic ligands with electron withdrawing and electron donating groups. These nanoparticles have lower sensitivity compared to those with aliphatic ligands suggesting the structures of these ligands is more important than their pka on resist sensitivity. The influence of ligand structure was further studied by comparing the nanoparticles’ solubility for a single type ligand to mixtures of ligands. The mixture of nanoparticles showed improved pattern quality. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
AB - Ligand stabilized metal oxide nanoparticle resists are promising candidates for EUV lithography due to their high sensitivity for high-resolution patterning and high etching resistance. As ligand exchange is responsible for the patterning mechanism, we systematically studied the influence of ligand structures of metal oxide EUV nanoparticles on their sensitivity and dissolution behavior. ZrO2 nanoparticles were protected with various aromatic ligands with electron withdrawing and electron donating groups. These nanoparticles have lower sensitivity compared to those with aliphatic ligands suggesting the structures of these ligands is more important than their pka on resist sensitivity. The influence of ligand structure was further studied by comparing the nanoparticles’ solubility for a single type ligand to mixtures of ligands. The mixture of nanoparticles showed improved pattern quality. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
UR - http://hdl.handle.net/10754/599855
UR - http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.2084896
UR - http://www.scopus.com/inward/record.url?scp=84980733173&partnerID=8YFLogxK
U2 - 10.1117/12.2084896
DO - 10.1117/12.2084896
M3 - Conference contribution
SN - 9781628415247
BT - Extreme Ultraviolet (EUV) Lithography VI
PB - SPIE-Intl Soc Optical Eng
ER -