Syudy on a method of the thickness measurement of ultra-thin PtSi film

Shuang Liu; Yong Gong Ning; Yi Zhang; Huai Wu Zhang; Ai Chen; Jun Gang Liu; Jia De Yang; Kun Li

Syudy on a method of the thickness measurement of ultra-thin PtSi film

Shuang Liu^*, Yong Gong Ning, Yi Zhang, Huai Wu Zhang, Ai Chen, Jun Gang Liu, Jia De Yang, Kun Li

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

Based on X-ray photoelectron spectrum intensity measurements of thin film by ARXPS, a method of determination of the thickness of PtSi ultra-thin films through calculations of electrom mean free path, is described in this article. The result of calculation is in agreement with that of the TEM crystal lattice images analysis. It shows that the method is convenient and can be used to determine the thickness of other ultra-thin films.

Original language	English (US)
Pages (from-to)	1450
Number of pages	1
Journal	Wuli Xuebao/Acta Physica Sinica
Volume	50
Issue number	8
State	Published - Aug 2001
Externally published	Yes

Keywords

ARXPS
TEM crystal lattice images
Ultra-thin PtSi film

ASJC Scopus subject areas

General Physics and Astronomy

Cite this

@article{744442a6d9c84e5c9fe118c940c305d9,

title = "Syudy on a method of the thickness measurement of ultra-thin PtSi film",

abstract = "Based on X-ray photoelectron spectrum intensity measurements of thin film by ARXPS, a method of determination of the thickness of PtSi ultra-thin films through calculations of electrom mean free path, is described in this article. The result of calculation is in agreement with that of the TEM crystal lattice images analysis. It shows that the method is convenient and can be used to determine the thickness of other ultra-thin films.",

keywords = "ARXPS, TEM crystal lattice images, Ultra-thin PtSi film",

author = "Shuang Liu and Ning, {Yong Gong} and Yi Zhang and Zhang, {Huai Wu} and Ai Chen and Liu, {Jun Gang} and Yang, {Jia De} and Kun Li",

year = "2001",

month = aug,

language = "English (US)",

volume = "50",

pages = "1450",

journal = "Wuli Xuebao/Acta Physica Sinica",

issn = "1000-3290",

publisher = "Science Press",

number = "8",

}

TY - JOUR

T1 - Syudy on a method of the thickness measurement of ultra-thin PtSi film

AU - Liu, Shuang

AU - Ning, Yong Gong

AU - Zhang, Yi

AU - Zhang, Huai Wu

AU - Chen, Ai

AU - Liu, Jun Gang

AU - Yang, Jia De

AU - Li, Kun

PY - 2001/8

Y1 - 2001/8

N2 - Based on X-ray photoelectron spectrum intensity measurements of thin film by ARXPS, a method of determination of the thickness of PtSi ultra-thin films through calculations of electrom mean free path, is described in this article. The result of calculation is in agreement with that of the TEM crystal lattice images analysis. It shows that the method is convenient and can be used to determine the thickness of other ultra-thin films.

AB - Based on X-ray photoelectron spectrum intensity measurements of thin film by ARXPS, a method of determination of the thickness of PtSi ultra-thin films through calculations of electrom mean free path, is described in this article. The result of calculation is in agreement with that of the TEM crystal lattice images analysis. It shows that the method is convenient and can be used to determine the thickness of other ultra-thin films.

KW - ARXPS

KW - TEM crystal lattice images

KW - Ultra-thin PtSi film

UR - http://www.scopus.com/inward/record.url?scp=0346452926&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0346452926

SN - 1000-3290

VL - 50

SP - 1450

JO - Wuli Xuebao/Acta Physica Sinica

JF - Wuli Xuebao/Acta Physica Sinica

IS - 8

ER -

Syudy on a method of the thickness measurement of ultra-thin PtSi film

Abstract

Keywords

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this