Abstract
We have studied the effect of depositing a Mg-doped GaN cap layer on near-ultraviolet emitting In0.05Ga0.95N/Al 0.05Ga0.95N multiple quantum well structures, using photoluminescence spectroscopy and transmission electron microscopy. The room temperature (T = 300 K) photoluminescence spectra revealed a reduction in the integrated photoluminescence intensity of the capped structure, which is shown by time decay measurements to be due to greater competition from non-radiative recombination processes. The structural analysis of the samples using electron microscopy has not shown any evidence of Mg-induced defects. We suggest that the non-radiative recombination path is related to the diffusion of Mg atoms into the quantum well region and the formation of Mg-nitrogen vacancy complexes.
Original language | English (US) |
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Pages (from-to) | 2005-2008 |
Number of pages | 4 |
Journal | Physica Status Solidi (C) Current Topics in Solid State Physics |
Volume | 3 |
DOIs | |
State | Published - 2006 |
Externally published | Yes |
Event | 6th International Conference on Nitride Semiconductors, ICNS-6 - Bremen, Germany Duration: Aug 28 2005 → Sep 2 2005 |
ASJC Scopus subject areas
- Condensed Matter Physics