The interface anisotropy of Fe Ti multilayers prepared by dual-facing-target sputtering

M. S. Liu; E. Y. Jiang; Z. J. Wang; X. X. Zhang; Y. G. Liu

doi:10.1016/0304-8853(94)00538-9

The interface anisotropy of Fe Ti multilayers prepared by dual-facing-target sputtering

M. S. Liu, E. Y. Jiang^*, Z. J. Wang, X. X. Zhang, Y. G. Liu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

We have fabricated Fe Ti multilayers by the dual-facing-target sputtering (DFTS) method. The total interaction effective field H_eff of Fe Ti multilayers were determined from the ferromagnetic resonance data in a rotating external magnetic field. The interface contribution to the magnetic anisotropy was extracted from the anisotropy field H_A that was obtained from H_eff. The interface anisotropy constant of Fe Ti multilayers K_s is 0.18 erg/cm². This indicates the presence of a perpendicular interface anisotropy.

Original language	English (US)
Pages (from-to)	537-538
Number of pages	2
Journal	Journal of Magnetism and Magnetic Materials
Volume	140-144
Issue number	PART 1
DOIs	https://doi.org/10.1016/0304-8853(94)00538-9
State	Published - Feb 1995
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1016/0304-8853(94)00538-9

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title = "The interface anisotropy of Fe Ti multilayers prepared by dual-facing-target sputtering",

abstract = "We have fabricated Fe Ti multilayers by the dual-facing-target sputtering (DFTS) method. The total interaction effective field Heff of Fe Ti multilayers were determined from the ferromagnetic resonance data in a rotating external magnetic field. The interface contribution to the magnetic anisotropy was extracted from the anisotropy field HA that was obtained from Heff. The interface anisotropy constant of Fe Ti multilayers Ks is 0.18 erg/cm2. This indicates the presence of a perpendicular interface anisotropy.",

author = "Liu, {M. S.} and Jiang, {E. Y.} and Wang, {Z. J.} and Zhang, {X. X.} and Liu, {Y. G.}",

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T1 - The interface anisotropy of Fe Ti multilayers prepared by dual-facing-target sputtering

AU - Liu, M. S.

AU - Jiang, E. Y.

AU - Wang, Z. J.

AU - Zhang, X. X.

AU - Liu, Y. G.

PY - 1995/2

Y1 - 1995/2

N2 - We have fabricated Fe Ti multilayers by the dual-facing-target sputtering (DFTS) method. The total interaction effective field Heff of Fe Ti multilayers were determined from the ferromagnetic resonance data in a rotating external magnetic field. The interface contribution to the magnetic anisotropy was extracted from the anisotropy field HA that was obtained from Heff. The interface anisotropy constant of Fe Ti multilayers Ks is 0.18 erg/cm2. This indicates the presence of a perpendicular interface anisotropy.

AB - We have fabricated Fe Ti multilayers by the dual-facing-target sputtering (DFTS) method. The total interaction effective field Heff of Fe Ti multilayers were determined from the ferromagnetic resonance data in a rotating external magnetic field. The interface contribution to the magnetic anisotropy was extracted from the anisotropy field HA that was obtained from Heff. The interface anisotropy constant of Fe Ti multilayers Ks is 0.18 erg/cm2. This indicates the presence of a perpendicular interface anisotropy.

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U2 - 10.1016/0304-8853(94)00538-9

DO - 10.1016/0304-8853(94)00538-9

M3 - Article

AN - SCOPUS:17344388947

SN - 0304-8853

VL - 140-144

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JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - PART 1

ER -

The interface anisotropy of Fe Ti multilayers prepared by dual-facing-target sputtering

Abstract

ASJC Scopus subject areas

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