Three-dimensional micro- and nanostructuring by combination of nanoimprint and x-ray lithography

Massimo Tormen*, Filippo Romanato, Matteo Altissimo, Luca Businaro, Patrizio Candeloro, Enzo M. Di Fabrizio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Scopus citations
Original languageEnglish (US)
Pages (from-to)766-770
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number2
StatePublished - 2004
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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