Abstract
Trilayered MoS2 metal-semiconductor-metal (MSM) photodetectors (PDs) exhibit the photogain is up to 24 with high responsivity (∼1.04 A/W). This is because photocarriers generated at the MoS2 between two Au electrodes drift toward the metal-semiconductor interfaces due to band bending under applied bias and are then trapped at the surface state sites at the Au/MoS2 interfaces, giving rise to the decrease in Schottky barrier height. Moreover, MoS2 MSM PDs show fast operation speed; as the contact spacing reduces from 8 to 4 μm, the rise time and fall time of PDs reduce from 70 to 40 μs and from 110 to 50 μs, respectively. Trilayered MoS2 MSM PDs can operate even after 2-MeV proton illumination with ∼1011 cm-2 fluences, indicating the high radiation tolerance. This work demonstrates that trilayer MoS2 opens up a new dimension for 2-D nanomaterial applications in harsh electronics.
Original language | English (US) |
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Article number | 6553644 |
Journal | IEEE Journal on Selected Topics in Quantum Electronics |
Volume | 20 |
Issue number | 1 |
DOIs | |
State | Published - 2014 |
Keywords
- Graphene
- MoS
- Radiation resistance
- harsh environment
- photodetector
ASJC Scopus subject areas
- Ceramics and Composites
- Atomic and Molecular Physics, and Optics
- Materials Chemistry
- Electrical and Electronic Engineering