Abstract
We report on the direct electron-beam patterning of a negative tone resist SU8-2000 for the fabrication of a two-dimensional photonic crystal (2D-PC) waveguide. The high refractive index of the SU8-2000 (about 1.69), its transparency above 360 nm, the good mechanical stability and the possibility of direct patterning by electron-beam lithography, make such resist ideal for the direct realization of high-resolution photonic crystal waveguides. The fabrication of a triangular array of sub-micron pillars (lattice constant of 300 nm and filling factor of 0.35) suitable for the realization of a 2D-PC waveguide on a glass substrate is reported. The energy dispersion diagram, calculated by the plane wave expansion technique, shows that this 2D-PC structure has a small photonic band gap (PBG) for the TM-like modes.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 388-391 |
| Number of pages | 4 |
| Journal | Microelectronic Engineering |
| Volume | 73-74 |
| DOIs | |
| State | Published - Jun 2004 |
| Externally published | Yes |
| Event | Micro and Nano Engineering 2003 - Cambridge, United Kingdom Duration: Sep 22 2003 → Sep 25 2003 |
Keywords
- Electron-beam lithography
- Photoresist
- Polymeric photonic crystals
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering