Ultralow-power deep-ultraviolet photodetection using oxide-nitride heterojunctions integrated on silicon

Nasir Alfaraj, Kuang Hui Li, Chun Hong Kang, Laurentiu Braic, Nicolae Catalin Zoita, Adrian Emil Kiss, Tien Khee Ng, Boon S. Ooi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A Si-integrated oxide-nitride deep-ultraviolet photodetector with remarkable photosensitivity is demonstrated. The proposed device topology is realized through the disordered nucleation of β-Ga2O3 crystals on monocrystalline TiN interlayers forming an oxide-nitride vertical heterostructure stack housed on a Si substrate. Spectral responsivity levels of about 240 A/W at illuminating power density levels of around 7.40 μW/cm2 were achieved.
Original languageEnglish (US)
Title of host publicationOxide-based Materials and Devices XIII
PublisherSPIE
ISBN (Print)9781510648753
DOIs
StatePublished - Mar 5 2022

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