Unique polymers via radical diene cyclization: Polyspironorbornanes and their application to 193 nm microlithography

Robert P. Meagley; Dario Pasini; Linus Y. Park; Jean M.J. Fréchet

doi:10.1039/a902405k

Unique polymers via radical diene cyclization: Polyspironorbornanes and their application to 193 nm microlithography

Robert P. Meagley, Dario Pasini, Linus Y. Park, Jean M.J. Fréchet^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

The design of novel alkylated norcamphor derivatives that undergo cyclopolymerization is explored; the resulting polymers incorporate suitable functional groups for chemical amplification and show excellent imaging characteristics under lithographic exposure at 193 nm.

Original language	English (US)
Pages (from-to)	1587-1588
Number of pages	2
Journal	CHEMICAL COMMUNICATIONS
Issue number	16
DOIs	https://doi.org/10.1039/a902405k
State	Published - Aug 21 1999
Externally published	Yes

ASJC Scopus subject areas

Catalysis
Electronic, Optical and Magnetic Materials
Ceramics and Composites
General Chemistry
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1039/a902405k

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title = "Unique polymers via radical diene cyclization: Polyspironorbornanes and their application to 193 nm microlithography",

abstract = "The design of novel alkylated norcamphor derivatives that undergo cyclopolymerization is explored; the resulting polymers incorporate suitable functional groups for chemical amplification and show excellent imaging characteristics under lithographic exposure at 193 nm.",

author = "Meagley, {Robert P.} and Dario Pasini and Park, {Linus Y.} and Fr{\'e}chet, {Jean M.J.}",

year = "1999",

month = aug,

day = "21",

doi = "10.1039/a902405k",

language = "English (US)",

pages = "1587--1588",

journal = "CHEMICAL COMMUNICATIONS",

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number = "16",

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T1 - Unique polymers via radical diene cyclization

T2 - Polyspironorbornanes and their application to 193 nm microlithography

AU - Meagley, Robert P.

AU - Pasini, Dario

AU - Park, Linus Y.

AU - Fréchet, Jean M.J.

PY - 1999/8/21

Y1 - 1999/8/21

N2 - The design of novel alkylated norcamphor derivatives that undergo cyclopolymerization is explored; the resulting polymers incorporate suitable functional groups for chemical amplification and show excellent imaging characteristics under lithographic exposure at 193 nm.

AB - The design of novel alkylated norcamphor derivatives that undergo cyclopolymerization is explored; the resulting polymers incorporate suitable functional groups for chemical amplification and show excellent imaging characteristics under lithographic exposure at 193 nm.

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U2 - 10.1039/a902405k

DO - 10.1039/a902405k

M3 - Article

AN - SCOPUS:0033592107

SN - 1359-7345

SP - 1587

EP - 1588

JO - CHEMICAL COMMUNICATIONS

JF - CHEMICAL COMMUNICATIONS

IS - 16

ER -

Unique polymers via radical diene cyclization: Polyspironorbornanes and their application to 193 nm microlithography

Abstract

ASJC Scopus subject areas

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