TY - JOUR
T1 - Vacancies and defect levels in III–V semiconductors
AU - Tahini, H. A.
AU - Chroneos, Alexander
AU - Grimes, R. W.
AU - Murphy, S. T.
AU - Schwingenschlögl, Udo
N1 - KAUST Repository Item: Exported on 2020-10-01
PY - 2013/8/13
Y1 - 2013/8/13
N2 - Using electronic structure calculations, we systematically investigate the formation of vacancies in III-V semiconductors (III = Al, Ga, and In and V = P, As, and Sb), for a range of charges ( −3≤q≤3 ) as a function of the Fermi level and under different growth conditions. The formation energies were corrected using the scheme due to Freysoldt et al. [Phys. Rev. Lett. 102, 016402 (2009)] to account for finite size effects. Vacancy formation energies were found to decrease as the size of the group V atom increased. This trend was maintained for Al-V, Ga-V, and In-V compounds. The negative-U effect was only observed for the arsenic vacancy in GaAs, which makes a charge state transition from +1 to –1. It is also found that even under group III rich conditions, group III vacancies dominate in AlSb and GaSb. For InSb, group V vacancies are favoured even under group V rich conditions.
AB - Using electronic structure calculations, we systematically investigate the formation of vacancies in III-V semiconductors (III = Al, Ga, and In and V = P, As, and Sb), for a range of charges ( −3≤q≤3 ) as a function of the Fermi level and under different growth conditions. The formation energies were corrected using the scheme due to Freysoldt et al. [Phys. Rev. Lett. 102, 016402 (2009)] to account for finite size effects. Vacancy formation energies were found to decrease as the size of the group V atom increased. This trend was maintained for Al-V, Ga-V, and In-V compounds. The negative-U effect was only observed for the arsenic vacancy in GaAs, which makes a charge state transition from +1 to –1. It is also found that even under group III rich conditions, group III vacancies dominate in AlSb and GaSb. For InSb, group V vacancies are favoured even under group V rich conditions.
UR - http://hdl.handle.net/10754/315780
UR - http://scitation.aip.org/content/aip/journal/jap/114/6/10.1063/1.4818484
UR - http://www.scopus.com/inward/record.url?scp=84883399506&partnerID=8YFLogxK
U2 - 10.1063/1.4818484
DO - 10.1063/1.4818484
M3 - Article
SN - 0021-8979
VL - 114
SP - 063517
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 6
ER -