Engineering
Heat Treatment
100%
Oxide Film
100%
Vapor Deposition
100%
Chemical Vapor Deposition
100%
Microstructure
66%
Raman Spectrum
66%
Nanoclusters
66%
Infrared Absorption
66%
Si Substrate
33%
Silicon Substrate
33%
Crystalline Silicon
33%
Fourier Transform
33%
Silicon Nanocrystal
33%
Blueshift
33%
Raman Peak
33%
Pure Silica
33%
Structural Modification
33%
Oxide Matrix
33%
Defects
33%
Damaged Layer
33%
Thin Films
33%
Room Temperature
33%
Gas Mixture
33%
Material Science
Plasma-Enhanced Chemical Vapor Deposition
100%
Nanoclusters
100%
Infrared Spectroscopy
100%
Film
100%
Amorphous Silicon
100%
Oxide Compound
100%
Absorption Spectrum
100%
Oxide Film
100%
Nanocrystalline Material
50%
Spectroscopy Technique
50%
Crystalline Material
50%
Thin Films
50%
Gas Mixture
50%
Physics
Raman Spectra
100%
Vapor Deposition
100%
Oxide Film
100%
Nanoclusters
66%
Ion Irradiation
66%
Amorphous Silicon
66%
Absorption Spectra
66%
Infrared Absorption
66%
Gas Mixture
33%
Nitrous Oxide
33%
Thin Films
33%
Fluence
33%
Stoichiometry
33%
Room Temperature
33%
Blue Shift
33%
Keyphrases
Si-rich Oxide
100%
Post-irradiation
33%
SiOx Thin Films
33%
Residual Hydrogen
33%
Hydrogen Loss
33%
Silicon Nanoclusters
33%
Si Nanoclusters
33%
Oxide Network
33%
Progressive Clustering
33%