Keyphrases
Lithography
100%
Water-soluble
100%
Chromophore
100%
Copolymer
100%
Antireflection Coating
100%
Coating Application
100%
Fabrication Methods
50%
Optical Properties
50%
I-line
50%
Spin Coating
25%
Water-based
25%
Device Fabrication
25%
Refractive Index
25%
Semiconductor Industry
25%
Design Process
25%
Resist Layer
25%
Reflected Light
25%
Fine Features
25%
Polymer Film
25%
Index Coefficients
25%
Absorption Coefficient
25%
Polymer Structure
25%
Side Chain
25%
Polymer Solubility
25%
Terpolymer
25%
Crosslink Density
25%
Ketoesters
25%
Thermally Activated Processes
25%
Crosslinking Method
25%
Polymer Properties
25%
Solubility Parameter
25%
Methacrylate Copolymer
25%
VOC Emissions
25%
Standing Wave Effect
25%
Regulatory Concerns
25%
Elipsometry
25%
Azobenzene Chromophores
25%
Coating Formulation
25%
Water-based Formulation
25%
Engineering
Lithography
100%
Coating Application
100%
Chromophore
100%
Reflected Light
25%
Side Chain
25%
Design Process
25%
Absorption Coefficient
25%
Feature Size
25%
Crosslinking Density
25%
Critical Dimension
25%
Refractive Index
25%
Standing Wave
25%
Material Science
Copolymer
100%
Antireflection Coating
100%
Lithography
100%
Polymer Films
25%
Device Fabrication
25%
Spin Coating
25%
Polymer Structure
25%
Refractive Index
25%
Density
25%
Chemical Engineering
Chromophore
100%
Copolymer
100%
Lithography
100%
Terpolymers
25%
Azobenzene
25%
Spin Coating
25%