Abstract
A wavefront sensor includes a mask and a sensor utilized to capture a diffraction pattern generated by light incident to the mask. A reference image is captured in response to a plane wavefront incident on the mask, and another measurement image is captured in response to a distorted wavefront incident on the mask. The distorted wavefront is reconstructed based on differences between the reference image and the measurement image.
Original language | English (US) |
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Patent number | WO2018083573A1 |
State | Published - May 11 2018 |