X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV

Altissimo Matteo; Romanato Filippo; Vaccari Lisa; Businaro Luca; Cojoc Danut; Kaulich Burkhard; Cabrini Stefano; Enzo Di Fabrizio

doi:10.1016/S0167-9317(02)00444-6

X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV

Altissimo Matteo, Romanato Filippo, Vaccari Lisa, Businaro Luca, Cojoc Danut, Kaulich Burkhard, Cabrini Stefano, Enzo Di Fabrizio

Research output: Contribution to journal › Conference article › peer-review

15 Scopus citations

Abstract

Progress on the fabrication of zone plates for hard X-rays is reported. The issue of achieving a high aspect ratio for lithographic structures has been addressed by developing a specific fabrication protocol based on the combined use of electron beam and proximity X-ray lithography. An example of a 1 mm diameter wide zone plate, optimized for a 23 keV X-ray beam, is presented, showing an aspect ratio of the outermost zone of up to 10. The most critical steps of the fabrication process are discussed on the basis of the results.

Original language	English (US)
Pages (from-to)	173-177
Number of pages	5
Journal	Microelectronic Engineering
Volume	61-62
DOIs	https://doi.org/10.1016/S0167-9317(02)00444-6
State	Published - Jul 2002
Externally published	Yes
Event	Micro and Nano Engineering 2001 - Grenoble, France Duration: Sep 16 2001 → Sep 19 2001

Keywords

X-ray lithography
Zone plates

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0167-9317(02)00444-6

Cite this

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title = "X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV",

abstract = "Progress on the fabrication of zone plates for hard X-rays is reported. The issue of achieving a high aspect ratio for lithographic structures has been addressed by developing a specific fabrication protocol based on the combined use of electron beam and proximity X-ray lithography. An example of a 1 mm diameter wide zone plate, optimized for a 23 keV X-ray beam, is presented, showing an aspect ratio of the outermost zone of up to 10. The most critical steps of the fabrication process are discussed on the basis of the results.",

keywords = "X-ray lithography, Zone plates",

author = "Altissimo Matteo and Romanato Filippo and Vaccari Lisa and Businaro Luca and Cojoc Danut and Kaulich Burkhard and Cabrini Stefano and {Di Fabrizio}, Enzo",

year = "2002",

month = jul,

doi = "10.1016/S0167-9317(02)00444-6",

language = "English (US)",

volume = "61-62",

pages = "173--177",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

note = "Micro and Nano Engineering 2001 ; Conference date: 16-09-2001 Through 19-09-2001",

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TY - JOUR

T1 - X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV

AU - Matteo, Altissimo

AU - Filippo, Romanato

AU - Lisa, Vaccari

AU - Luca, Businaro

AU - Danut, Cojoc

AU - Burkhard, Kaulich

AU - Stefano, Cabrini

AU - Di Fabrizio, Enzo

PY - 2002/7

Y1 - 2002/7

N2 - Progress on the fabrication of zone plates for hard X-rays is reported. The issue of achieving a high aspect ratio for lithographic structures has been addressed by developing a specific fabrication protocol based on the combined use of electron beam and proximity X-ray lithography. An example of a 1 mm diameter wide zone plate, optimized for a 23 keV X-ray beam, is presented, showing an aspect ratio of the outermost zone of up to 10. The most critical steps of the fabrication process are discussed on the basis of the results.

AB - Progress on the fabrication of zone plates for hard X-rays is reported. The issue of achieving a high aspect ratio for lithographic structures has been addressed by developing a specific fabrication protocol based on the combined use of electron beam and proximity X-ray lithography. An example of a 1 mm diameter wide zone plate, optimized for a 23 keV X-ray beam, is presented, showing an aspect ratio of the outermost zone of up to 10. The most critical steps of the fabrication process are discussed on the basis of the results.

KW - X-ray lithography

KW - Zone plates

UR - http://www.scopus.com/inward/record.url?scp=17944398077&partnerID=8YFLogxK

U2 - 10.1016/S0167-9317(02)00444-6

DO - 10.1016/S0167-9317(02)00444-6

M3 - Conference article

AN - SCOPUS:17944398077

SN - 0167-9317

VL - 61-62

SP - 173

EP - 177

JO - Microelectronic Engineering

JF - Microelectronic Engineering

T2 - Micro and Nano Engineering 2001

Y2 - 16 September 2001 through 19 September 2001

ER -

X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV

Abstract

Keywords

ASJC Scopus subject areas

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