Zone plate for x-ray applications

E. Di Fabrizio; A. Nottola; S. Cabrini; F. Romanato; L. Vaccari; A. Massimi

doi:10.1117/12.411653

Zone plate for x-ray applications

E. Di Fabrizio, A. Nottola, S. Cabrini, F. Romanato, L. Vaccari, A. Massimi

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution regime zone plate with 40 nm outermost zone and thickness of 0.2 μm are shown. For high efficiency performances, multilevel zone plate and continuous profile were fabricated to provide an increase of efficiency at the first diffraction order and to suppress higher ones. The combination of the two lithography allows a powerful flexibility at several energy regimes.

Original language	English (US)
Pages (from-to)	317-324
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4145
DOIs	https://doi.org/10.1117/12.411653
State	Published - 2001
Externally published	Yes

Keywords

Continuos profiling
Electron beam and X ray lithography
Electroplating
Zone Plate

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.411653

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title = "Zone plate for x-ray applications",

abstract = "High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution regime zone plate with 40 nm outermost zone and thickness of 0.2 μm are shown. For high efficiency performances, multilevel zone plate and continuous profile were fabricated to provide an increase of efficiency at the first diffraction order and to suppress higher ones. The combination of the two lithography allows a powerful flexibility at several energy regimes.",

keywords = "Continuos profiling, Electron beam and X ray lithography, Electroplating, Zone Plate",

author = "{Di Fabrizio}, E. and A. Nottola and S. Cabrini and F. Romanato and L. Vaccari and A. Massimi",

year = "2001",

doi = "10.1117/12.411653",

language = "English (US)",

volume = "4145",

pages = "317--324",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

}

TY - JOUR

T1 - Zone plate for x-ray applications

AU - Di Fabrizio, E.

AU - Nottola, A.

AU - Cabrini, S.

AU - Romanato, F.

AU - Vaccari, L.

AU - Massimi, A.

PY - 2001

Y1 - 2001

N2 - High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution regime zone plate with 40 nm outermost zone and thickness of 0.2 μm are shown. For high efficiency performances, multilevel zone plate and continuous profile were fabricated to provide an increase of efficiency at the first diffraction order and to suppress higher ones. The combination of the two lithography allows a powerful flexibility at several energy regimes.

AB - High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution regime zone plate with 40 nm outermost zone and thickness of 0.2 μm are shown. For high efficiency performances, multilevel zone plate and continuous profile were fabricated to provide an increase of efficiency at the first diffraction order and to suppress higher ones. The combination of the two lithography allows a powerful flexibility at several energy regimes.

KW - Continuos profiling

KW - Electron beam and X ray lithography

KW - Electroplating

KW - Zone Plate

UR - http://www.scopus.com/inward/record.url?scp=0035046641&partnerID=8YFLogxK

U2 - 10.1117/12.411653

DO - 10.1117/12.411653

M3 - Article

AN - SCOPUS:0035046641

SN - 0277-786X

VL - 4145

SP - 317

EP - 324

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

ER -

Zone plate for x-ray applications

Abstract

Keywords

ASJC Scopus subject areas

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